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filingDate 2005-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2006-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2006140471-A
titleOfInvention Etching solution for removing low dielectric constant dielectric film and low dielectric constant dielectric film etching method using the same
abstract An etching solution for removing a low dielectric constant dielectric film and a low dielectric constant dielectric film etching method using the same are provided. An etching solution for etching a dielectric film having a low dielectric constant according to the present invention includes an oxidizing agent for oxidizing the dielectric film having a low dielectric constant and an oxide etching agent for removing the oxide. Can be used to easily remove the dielectric film having a low dielectric constant in one step. [Selection] Figure 1
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