http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006126491-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_663cad2cddb9415ae5ba8d9c99803cda |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-07 |
| filingDate | 2004-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_50b1404024f7c4fd48710b17ac4b2ec6 |
| publicationDate | 2006-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2006126491-A |
| titleOfInvention | Processing method of photosensitive material |
| abstract | In a processing method including a step of applying a developer to a photosensitive material having at least one photosensitive layer, a method capable of processing the entire region of the photosensitive material more stably, particularly even in a high temperature environment. To provide. The object is achieved by applying the developer by reducing the coating amount of the developer after 300 mm from the front end of the photosensitive material to 0.8 times or less of the set coating amount. [Selection] Figure 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009168912-A |
| priorityDate | 2004-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.