http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006111891-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_669c01133740c5233f2c8738904ea3af
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-32
filingDate 2004-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_02328e4ece9d00bba22ece92f95421e9
publicationDate 2006-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2006111891-A
titleOfInvention Pressure gradient ion plating film deposition system
abstract PROBLEM TO BE SOLVED: To provide a vacuum film forming apparatus capable of dealing with a case where an electrically insulating material is formed and capable of sufficiently stably forming a film on a target substrate. In the ion plating film forming unit, a pressure gradient type plasma gun is provided on the downstream side in the substrate transport direction in the coating region, and the substrate width direction of the film forming drum from the side surface side of the film forming chamber. A short beam portion of the vacuum chamber that projects toward the outlet of the pressure gradient plasma gun, and surrounds the short tube portion. And a converging coil for contracting the cross section of the plasma beam from the pressure gradient plasma gun. The plasma beam is guided to the surface of the vapor deposition material disposed in the deposition chamber, and the electrical insulation is maintained. A thin film is formed on one surface of a substrate in a film formation region of a film drum, and an electron feedback current that surrounds the periphery of the plasma beam and feeds back electrically floating electrons in the short tube. A pole is provided. [Selection] Figure 1
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4613050-B2
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Total number of triples: 39.