| abstract |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for a solid-state imaging element lens capable of producing a solid-state imaging element lens having a high degree of freedom and a shape as per optical design. In addition, a solid-state imaging element lens using the photosensitive resin composition, a method for producing a solid-state imaging element lens using the photosensitive resin composition for the solid-state imaging element lens, and a solid-state imaging including the solid-state imaging element lens An element is provided. Solid imaging used in a method of forming a microlens using a photomask that controls a distribution of transmitted light amount when exposure is performed according to a distribution state of a fine pattern that is not resolved at an exposure wavelength when forming a microlens A photosensitive resin composition for element lenses, In the relationship between the mask opening ratio and the remaining film ratio when the photosensitive resin composition is irradiated and developed with the photosensitive film composition through the photomask through the photomask, the minimum mask opening ratio is in the range of 20% to 80%. A photosensitive resin composition for a solid-state imaging device lens, wherein R 2 when linearly approximated by multiplication is in the range of 0.950 to 1.000. [Selection figure] None |