http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006098707-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2004-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d59feb3cb14103900f77e3d888cb943d |
| publicationDate | 2006-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2006098707-A |
| titleOfInvention | Positive resist composition and pattern forming method using the same |
| abstract | PROBLEM TO BE SOLVED: To provide a positive resist composition excellent in PEB temperature dependency, line edge roughness, exposure latitude, and pattern profile, and a pattern forming method using the same. (A) a resin having an organic group having a specific structure and having increased solubility in an alkali developer by the action of an acid; (B) a carbon atom having 2 or 3 carbon atoms which has been fluorine-substituted by irradiation with actinic rays or radiation. A positive resist composition comprising a compound that generates alkanesulfonic acid and (C) a solvent. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2197924-A2 |
| priorityDate | 2004-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 158.