| abstract |
Photosensitive composition used in semiconductor manufacturing process such as IC, circuit board such as liquid crystal and thermal head, and other photofabrication process, and pattern forming method using the photosensitive composition And a photosensitive composition having improved PEB temperature dependency and line edge roughness, and a pattern forming method using the photosensitive composition. A photosensitive composition containing a compound having a specific structure and a pattern forming method using the photosensitive composition. [Selection figure] None |