| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-114 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2004-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b371d878503af0da2b50566aef90ca7d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c64bf1e627002819df6a4a811220b667
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_92b7e808958147b5d966629d4d142126 |
| publicationDate |
2006-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2006078640-A |
| titleOfInvention |
Resist composition and resist pattern forming method |
| abstract |
PROBLEM TO BE SOLVED: To provide a resist composition and a resist pattern forming method capable of forming a high resolution pattern with reduced LER. A base material component (A) having an acid dissociable, dissolution inhibiting group and increasing alkali solubility by the action of an acid, and an acid generator component (B) that generates an acid upon exposure to an organic solvent ( The phenol in the polyhydric phenol compound (a), which is a resist composition dissolved in C), wherein the substrate component (A) has two or more phenolic hydroxyl groups and a molecular weight of 300 to 2500. A resist composition comprising a protector (A1) in which a part or all of a functional hydroxyl group is protected with an acid dissociable, dissolution inhibiting group, and the organic solvent (C) contains an alcohol. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006134811-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7858819-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008072085-A |
| priorityDate |
2004-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |