http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006075975-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8fb9f44db08d1c42a53f3d28eaae416f
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
filingDate 2004-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e9bfc5482c4073c109848555e93d9874
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4ebb053429fba41535ee660daf9d9e86
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publicationDate 2006-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2006075975-A
titleOfInvention Polishing liquid composition
abstract A polishing liquid composition having a small surface roughness after polishing, significantly reducing nanoscratches, and capable of polishing economically, and used for preparing the polishing liquid composition Provided is a method for producing a substrate comprising a polishing particle preparation liquid and a process using the polishing liquid composition. A polishing composition comprising an abrasive and water and having a pH of 0.1 to 7 that satisfies the following conditions: (1) Abrasive particles of 0.56 μm or more and less than 1 μm are contained in the polishing composition. 500,000 or less per 1 cm 3 and (2) 1 μm or more of abrasive particles are 0.001% by weight or less with respect to all abrasive particles in the polishing composition, and the substrate is polished using the polishing composition The manufacturing method of a board | substrate which has the process to do. [Selection figure] None
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9080080-B2
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priorityDate 2004-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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