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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B7-02
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filingDate 2005-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9366d564e31c4c7aab4f4ab13f818a7e
publicationDate 2006-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2006072367-A
titleOfInvention Low refractive index SiO2 film and manufacturing method thereof
abstract A use of a material for the a SiO 2 film, yet its refractive index to provide a SiO 2 film and a manufacturing method thereof lower refractive index than the original SiO 2 film. SOLUTION: A low refractive index SiO 2 film into which a low refractive index element in which part or all of H atoms of an alkyl group having 1 to 4 carbon atoms are substituted with F atoms is introduced is hydrolyzed. This is useful because the low refractive index effect is maintained for a long time. [Selection figure] None
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150100817-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10435513-B2
priorityDate 1996-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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