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filingDate 2004-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f7473073dadbeac4aea2675cd36898ae
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publicationDate 2006-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2006052453-A
titleOfInvention Thin film manufacturing method and thin film
abstract PROBLEM TO BE SOLVED: To obtain a thin film of good quality when forming a thin film by generating discharge plasma using a source gas containing a carbon source. A substrate is placed on at least one of counter electrodes. A discharge voltage is generated by applying a pulse voltage between the counter electrodes 4 and 5 in an atmosphere containing a source gas A containing a carbon source, and a thin film 7 is formed on the substrate 6. A positive pulse and a negative pulse are applied as the pulse voltage, and the pulse half-value width of the positive pulse and the negative pulse is 1000 nsec or less. [Selection] Figure 1
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2009102070-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014037340-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008045180-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012233257-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103849872-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009084692-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014192916-A1
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