| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d97cb748898aa080b013f7f35bc8b434 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67051
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2103-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2209-00 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N33-18 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-3577
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-359
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-27
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-35
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N33-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-78 |
| filingDate |
2004-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ba3808c41df5c07cb590dbc76633f9ea |
| publicationDate |
2006-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2006029880-A |
| titleOfInvention |
Water quality evaluation method, ultrapure water evaluation apparatus and ultrapure water production system using the method |
| abstract |
[PROBLEMS] To provide a water quality evaluation method for easily and highly sensitively evaluating the water quality such as etching properties of ultrapure water used as cleaning water for manufacturing semiconductors and liquid crystals using the degree of influence on a high-purity silicon substance as an index, and An ultrapure water evaluation apparatus using an evaluation method and an ultrapure water production system including the ultrapure water evaluation apparatus are provided. Sample water such as ultrapure water produced by an ultrapure water production apparatus is brought into contact with a high-purity silicon substance, and the concentration of silica contained in the sample water after contact with the high-purity silicon substance is measured, An increase in silica concentration relative to the sample water before contact with the high-purity silicon substance is calculated, and based on the increase in silica concentration, it is determined whether the water to be used has the property of etching the silicon surface. . [Selection] Figure 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010236906-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010249651-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011174869-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010013586-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017067616-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011072963-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008101982-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019020154-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7054995-B2 |
| priorityDate |
2004-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |