| abstract |
PROBLEM TO BE SOLVED: To provide a polysilane-based photosensitive resin composition having photosensitivity, capable of alkali development, and hardly causing deterioration or change in pattern shape, and a thin film pattern forming method using the photosensitive composition. Objective. A polysilane represented by the following general formula (1), a sensitizer, and translucent particles in which at least a part of the surface is hydrophobized, are translucent with respect to 100 parts by weight of polysilane. A photosensitive resin composition containing 25 to 3000 parts by weight of particles, and a thin film pattern forming method using the photosensitive composition. [Chemical 1] In the formula, R 1 , R 2 , R 3 and R 4 are a group consisting of a substituted or unsubstituted aliphatic hydrocarbon group, alicyclic hydrocarbon group, aromatic hydrocarbon group and polar group, and hydrogen. Are groups independently selected from each other. m and n are integers. [Selection figure] None |