http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006011039-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6c8d4dc7bd1a30d8fda907fceaeb4e69 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| filingDate | 2004-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_779071ab3d97d002aa01ddd46cfc2089 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_51476d315bb70eaafc31d3edb5a27c56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3a3710018301de93ddf0851bd2e45b31 |
| publicationDate | 2006-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2006011039-A |
| titleOfInvention | Resist image forming method |
| abstract | PROBLEM TO BE SOLVED: To provide an image forming method using a resist image forming material obtained by adhering an image forming material such as a dry film to a substrate to be processed by a method such as laminating, and a chemical such as a degreasing treatment agent even in a fine pattern The present invention provides a method for obtaining a resist image that has good chemical resistance to the substrate, has practically sufficient adhesion to a substrate to be processed, and has excellent resist releasability. A resist image forming material obtained by bringing a photopolymerizable composition surface of a resist image forming material having a layer of a photopolymerizable composition into close contact with a substrate to be processed is developed after exposure. Then, in the method for forming a resist image, the resist image forming surface of the resist image obtained by development is exposed entirely. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016009188-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020203790-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-6852234-B2 |
| priorityDate | 2004-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 98.