http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006002118-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-26 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-492 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 2004-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0f43fda4427c8906351e11f3642cf6e1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bffa4a732672dd927e60534c6ed14fee http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea0add81bb44226ce3a7adcf9dd82631 |
publicationDate | 2006-01-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2006002118-A |
titleOfInvention | Polymer compound, resist material, and pattern forming method |
abstract | A polymer compound having a weight average molecular weight of 1,000 to 50,000 and containing at least one repeating unit represented by formulas (1) and (2). [Chemical 1] [R 1 and R 3 are H or CH 3 , R 4 is an alkylene group, and R 2 is a substituent having a lactone structure selected from formulas (R 2 -1) to (R 2 -4). [Chemical 2] (When Y is CH 2 or O, Y is CH 2 , R 5 is CO 2 R 7 , Y is O, R 5 is H or CO 2 R 7 , R 6 is H or an alkyl group, R 7 is An alkyl group or a group having an oxygen atom inserted between carbon-carbon bonds of the alkyl group.)] [Effect] The polymer compound of the present invention is used as a base resin for resist materials, particularly chemically amplified positive resist materials, and provides high sensitivity, resolution, dry etching resistance, and good substrate adhesion. Then, a resist pattern in which the pattern side wall is prevented from being rough is provided. [Selection figure] None |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010190993-A |
priorityDate | 2004-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 819.