http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005534595-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C15-02 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C15-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C15-00 |
| filingDate | 2003-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2005-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2005534595-A |
| titleOfInvention | Process for reducing and controlling the concentration of hexafluorosilicate during polishing of glass articles in polishing baths containing sulfuric acid and hydrofluoric acid |
| abstract | The present invention relates to a method for reducing and controlling the concentration of hexafluorosilicate ions generated when a glass object is polished with a polishing bath containing sulfuric acid and hydrofluoric acid. Potassium fluoride, potassium sulfate, sodium fluoride, sodium sulfate, or aluminum sulfate is added to the polishing bath or sulfuric acid cleaning bath in such an amount that the concentration of fluoride ions is prevented from dropping below the optimum working range. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2017111091-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2010004925-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5392576-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010004925-A1 |
| priorityDate | 2002-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 61.