http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005532247-A

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filingDate 2003-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2005-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2005532247-A
titleOfInvention Method and apparatus for producing preforms from synthetic quartz glass using plasma assisted deposition
abstract A multi-nozzle deposition burner is fed with a hydrogen-free medium stream containing a glass starting material and a carrier gas, and the glass starting material is introduced into the plasma zone using the deposition burner, and SiO 2 is introduced into the plasma zone. A method for producing a preform made of synthetic quartz glass using a plasma-assisted deposition method is known, which is oxidized during the formation of the particles and SiO 2 particles are deposited on the deposition surface and directly vitrified at that time. . Starting from that, in order to increase the deposition efficiency, it is proposed according to the invention that the medium stream is focused in the direction of the plasma zone (4) using a deposition burner (1). A multi-nozzle plasma burner suitable for the implementation of the method and provided with a medium nozzle for supplying a medium flow to the plasma zone so that the medium nozzle (7) is focused in the direction of the plasma zone (4). It is characterized by being composed. Focusing takes place using the taper (6) of the media nozzle (7).
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101221379-B1
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