| abstract |
Provided are a wiring etching solution, a wiring manufacturing method using the same, a thin film transistor array substrate including the wiring, and a manufacturing method thereof. [Solution] In the method of manufacturing a thin film transistor substrate according to the present invention, a gate line including a gate line, a gate electrode connected to the gate line, and a gate pad is formed on an insulating substrate. Next, a gate insulating film and a semiconductor layer are sequentially formed, a data line intersecting with the gate line, a source electrode connected to the data line and adjacent to the gate electrode, and a drain positioned on the opposite side of the source electrode with respect to the gate electrode A data line connected to the electrode and the data line is formed. Next, a protective film is laminated and the protective film is patterned to form a contact hole exposing at least the drain electrode, and a conductive film made of silver or a silver alloy is laminated on the protective film, and iron nitrate, nitric acid, The conductive film is patterned using an etching solution containing acetic acid, hexaethylene glycol tetramine and pure water, and a reflective film connected to the drain electrode through the contact hole is formed. |