http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005520328-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S5-0265 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S5-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S5-22 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01S5-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01S5-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01S5-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01S5-026 |
| filingDate | 2003-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2005-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2005520328-A |
| titleOfInvention | Method for manufacturing optical communication device and optical communication device |
| abstract | The invention comprises a first device comprising a first set of layers comprising at least a first waveguide arranged in a mesa structure, and a second device connected to said first device in the optical transmission direction The present invention relates to an optical communication device including a second set of layers including at least a second waveguide layer formed in a region. A covering layer is disposed over the mesa structure, the second device region, and the surrounding semiconductor material. A contact layer is disposed on the covering layer, and first and second metal contacts are disposed on the contact layer. The first set of layers, the covering layer, and the contact layer are formed by removing the adjacent material in the etching process. An insulating material is applied around the unetched coating and contact layers. The invention also relates to a production method. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009004488-A |
| priorityDate | 2002-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 19.