| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F214-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-20 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F216-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F232-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-20 |
| filingDate |
2003-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2005-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2005519167-A |
| titleOfInvention |
Fluorinated copolymers for microlithographic printing |
| abstract |
Photoresist compositions for microlithographic printing and fluorinated copolymers useful in related processes are described. These copolymers are derived from acrylate monomers that contain fluoroalcohol or protected fluoroalcohol functional groups and fluoroalkyl groups or hydroxyl-substituted alkyl groups that simultaneously impart high ultraviolet (UV) transparency and developability in basic media to these materials. Including derived repeating units. The material of the present invention has high UV transparency, particularly at 193 nm and 157 nm, making the material of the present invention very useful for lithographic printing at these short wavelengths. |
| priorityDate |
2002-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |