abstract |
The present invention relates to a CMP composition for use with nickel / phosphorus alloys. The CMP composition of the present invention has abrasive particles and an oxidizing agent, a regulator that adjusts the action of the oxidizing agent, respectively, a phosphonic acid group and an ammonium group or an amine group, and optionally an organic carboxylic acid group. Contains first and second accelerators that sequester the removed material. |