| abstract |
The present invention relates to a method for forming a high-resolution pattern of material on a substrate by catalytic reaction. There are many types of catalytic reactions that occur on the surface of the substrate material, such as autocatalytic coating reactions, and such reactions are used to speed up or activate the reaction in gaseous, liquid or solid environments. be able to. In general, in such reactions, the catalytic material used is applied to or acts on the entire substrate material, so that the reaction occurs across the substrate. Thus, if the reaction needs to occur only on a portion of the surface of the substrate, an additional process such as etching or photolithography needs to be performed. These increase the complexity of the reaction, affect the cost and generate waste. Accordingly, it is an object of the present invention to provide a method of preparing a substrate material that can initiate a catalytic reaction on a predetermined area of the substrate that alleviates some of the above disadvantages. |