| abstract |
The present invention relates to a positive photosensitive resin composition used in an LCD manufacturing process, and more specifically, includes an alkali-soluble resin and a novel quinonediazide sulfonic acid ester compound, and developability, remaining film ratio, chemical resistance, etc. In addition, the pattern formation is easy, the transmittance is excellent, and it is suitable for forming an interlayer insulating film such as a liquid crystal display element or an integrated circuit element. |