| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G61-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2004-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_29407907a39a844a28ecb90f4f3aa9f9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_efa468b361066689cdf41ee3391659d7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_106a6a29310e6777cbd57816914fb42b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b371d878503af0da2b50566aef90ca7d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d2a6564d37d593cb43a9d727ba2ef3bf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de9c993ed66f82baae6aa97500ecf35e |
| publicationDate |
2005-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2005350495-A |
| titleOfInvention |
Polymer and positive resist composition |
| abstract |
PROBLEM TO BE SOLVED: To provide a polymer capable of forming a resist pattern having high resolution and excellent etching resistance, a positive resist composition, and a resist pattern forming method. A polymer comprising a structural unit (a1) represented by the following general formula (I) and a structural unit (a2) represented by the following general formula (II). A polymer comprising the structural unit (a1) and the structural unit (a3) represented by the following general formula (III). A polymer comprising the structural unit (a1), the structural unit (a2), and the structural unit (a3). [Chemical 1] [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015135983-A |
| priorityDate |
2004-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |