http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005347764-A

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filingDate 2005-07-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_558d93c84aa5b0b7229147f748bb1bb9
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publicationDate 2005-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2005347764-A
titleOfInvention Manufacturing method of image display device
abstract PROBLEM TO BE SOLVED: To provide a manufacturing method of an image display device provided with an active matrix substrate having a high performance thin film transistor circuit operating at a high speed mobility in a driving circuit for driving pixel portions arranged in a matrix. Irradiation while scanning a pulse modulated laser beam or pseudo CW laser beam on a polysilicon film formed in a drive circuit region DAR1 around a pixel region PAR of an active matrix substrate SUB1 constituting an image display device Then, a discontinuous modified region of the substantially band-like crystalline silicon film modified so as to have a continuous grain boundary in the scanning direction is formed. A drive circuit having an active element such as a thin film transistor is formed in the virtual tile TL formed in the discontinuous modified region so that the channel direction is substantially the crystal growth direction of the band-like crystalline silicon film. [Selection] FIG.
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Total number of triples: 34.