| abstract |
Coating composition for use with overcoated photoresist A composition (particularly an antireflective coating composition or “ARC”) is provided, which can reduce the reflection of exposure radiation from the substrate back to the overcoated photoresist layer, and / Or can function as a planarization or via fill layer. More particularly, the present invention relates to an organic coating composition, particularly an antireflective coating composition containing a polyester resin component that includes repeating units that include phenolic groups and / or hydroxyalkyl cyanurate groups. [Selection figure] None |