http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005330455-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dbdfa36b677f4ef61245ca725011e221 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-18 |
| filingDate | 2004-07-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1cfc46521d00bae671275ec0190854e7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4d762ea438f2a64942ec477628b6e646 |
| publicationDate | 2005-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2005330455-A |
| titleOfInvention | Thin film manufacturing method |
| abstract | PROBLEM TO BE SOLVED: To provide a method for producing a thin film using a compound that can be easily converted into a material having high heat resistance by baking, is soluble in a solvent and has good film formability, and after film formation To provide a method for producing a thin film using a silsesquioxane compound from which a highly heat-resistant transparent film can be easily obtained by firing. A thin film manufacturing method comprising: applying a solution of a silsesquioxane compound in which at least two cage-like silsesquioxanes are bonded via a bonding group onto a substrate; and then thermally decomposing the bonding group. Method. [Selection] No selection. |
| priorityDate | 2004-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 49.