http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005330367-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 |
| filingDate | 2004-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ab814f09c2fa1ff54e325def971b4d4c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b40ada315d0789564192dceb9481ef6d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f8074c5ce71b177b150e0cb96c49017 |
| publicationDate | 2005-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2005330367-A |
| titleOfInvention | Copolymer and radiation-sensitive resin composition |
| abstract | A radiation-sensitive resin composition having a small variation in the width of a resist pattern, high sensitivity to radiation, and excellent etching resistance, and a copolymer that can be suitably used for this resin composition. A copolymer comprising (A) a unit represented by the following formula (1) and (B) a unit represented by the following formula (2) is provided. [Chemical 1] In [Equation (1), R 1 represents a hydrogen atom or a monovalent organic group, n is a natural number of 1-3. ] [Chemical formula 2] In [the formula (2), R 2 represents a hydrogen atom or a monovalent organic group, a and b are natural numbers of 1 to 3. ] [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014133048-A1 |
| priorityDate | 2004-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 244.