http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005325395-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e9157b5509f488a95c4aef20d8820a4f http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9cf4a6a454fc8c7effdcf0f783f25a62 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-509 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B65D1-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B65D23-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B65D25-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B65D23-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-511 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 |
| filingDate | 2004-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6233650d9d2eba2cc2573517385422e6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ce23b726da523954eeecc32007d0f2ac http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f45f8159e7d925c83fbf6e1ea203dacc |
| publicationDate | 2005-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2005325395-A |
| titleOfInvention | Plasma CVD film forming apparatus and method for manufacturing CVD film coated plastic container |
| abstract | 【Task】 The object of the present invention is to prevent plasma non-ignition even if a matching failure of an automatic matching device occurs due to an unexpected impedance change due to separation of carbon-based foreign matter adhering to the apparatus, and always performs long-term continuous operation. It is to produce a container having a gas barrier property of a certain quality or higher. [Solution] The plasma CVD film forming apparatus according to the present invention is a source gas supply means for supplying a source gas to at least one of a vacuum chamber having an accommodation space for a plastic container and an internal space or an external space of the container disposed in the accommodation space. And plasma generation means for forming a CVD film on at least one of the inner surface and the outer surface of the container. The apparatus is characterized in that a spark generating means is provided in an exhaust path communicating with the accommodation space and the exhaust means. [Selection] Figure 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/FR-3091875-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015520478-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020148487-A1 |
| priorityDate | 2004-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 36.