http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005316431-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2053 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F267-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-44 |
filingDate | 2005-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0a187aa555fb12707f603e1fa9d5ce8a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6a3b093a51dbfaeb27de233e7d23716e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_665afa016a6ca2f280599408e65045a1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_05fbbbd3dfaecb37dd32ee45909b7720 |
publicationDate | 2005-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2005316431-A |
titleOfInvention | Photosensitive composition and photosensitive film, and permanent pattern and method for forming the same |
abstract | PROBLEM TO BE SOLVED: To provide a photosensitive composition having a small surface tackiness, good laminating property and handleability, excellent storage stability, excellent surface hardness and heat resistance after development, and a photosensitive film using the same. And providing a high-definition permanent pattern and an efficient formation method thereof. A copolymer obtained by reacting 0.1 to 1.2 equivalents of a primary amine compound with an anhydride group of a maleic anhydride copolymer, a polymerizable compound, and a photopolymerization initiator. And at least a photosensitive composition, a photosensitive film using the same, a permanent pattern and a method for forming the same. In particular, the copolymer is an anhydride of a copolymer comprising maleic anhydride, an aromatic vinyl monomer, and a vinyl monomer having a glass transition temperature (Tg) of the homopolymer of less than 80 ° C. An embodiment obtained by reacting 0.1 to 1.0 equivalent of a primary amine compound with respect to a group, an embodiment in which a thermal crosslinking agent is further contained, and the thermal crosslinking agent is an alkylated methylol melamine are preferred. [Selection figure] None |
priorityDate | 2004-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 532.