| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_67f2bb9a79bd8433343ae221f81551cf |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2201-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C1-1025
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C1-1016
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C1-1008
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2201-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2201-02 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41N3-038 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41C1-10 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41N3-03
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41N1-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
| filingDate |
2004-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_afa8ba99622e2d368450393a7f05a7bd |
| publicationDate |
2005-11-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2005305740-A |
| titleOfInvention |
Aluminum plate support for photosensitive lithographic printing plate material, its production method and photosensitive lithographic printing plate material |
| abstract |
PROBLEM TO BE SOLVED: To provide a photosensitive lithographic printing plate material having excellent printing durability and excellent stain resistance during printing, a support for providing the same, and a plate making method thereof. An aluminum plate support for a photosensitive lithographic printing plate material, which is subjected to roughening treatment and anodizing treatment, followed by treatment with an aqueous solution containing polyvinylphosphonic acid, followed by drying at 150 to 230 ° C. Manufacturing method. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007145060-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005324338-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009517720-A |
| priorityDate |
2004-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |