| abstract |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of forming a cured coating film excellent in ink repellency, ink falling property, adhesion to a substrate, and coating film appearance, and a cured film of the photosensitive resin composition. A copolymer (A) obtained by polymerizing a monomer composition containing a fluorine atom-containing monomer and a silicon atom-containing monomer, and an alkali-soluble compound having a carboxyl group and / or a phenolic hydroxyl group. A monomer composition comprising a resin (B), a crosslinking agent (C) that is a compound having two or more groups capable of reacting with a carboxyl group and / or a phenolic hydroxyl group, and a photoacid generator (D) The content of fluorine atoms in is from 1 to 30% by mass, and the proportion of the copolymer (A) in the total solid content of the photosensitive resin composition is from 1.5 to 30% by mass for light having a wavelength of from 100 to 600 nm. Photosensitive resin composition and coated film cured product thereof. [Selection figure] None |