http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005292463-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate | 2004-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b40ada315d0789564192dceb9481ef6d |
publicationDate | 2005-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2005292463-A |
titleOfInvention | Radiation sensitive resin composition |
abstract | PROBLEM TO BE SOLVED: To provide a water-stable film at the time of immersion exposure and excellent in immersion resistance and resolution. SOLUTION: The acid generator constituting the radiation-sensitive resin composition for immersion exposure is an acid generator containing a fluorine atom, and in particular, the cation portion of the onium salt contains at least one fluorine atom, and the onium salt Is a sulfonium salt, and the anion site of the onium salt is represented by the following formula (1) or (2). [Chemical 1] In Formula (1) and Formula (2), Rf is a fluorine atom or a perfluoroalkyl group, R is a monovalent organic group not containing a fluorine atom, n is an integer of 1 to 5, and m is 1 to 3. Each represents an integer. [Selection] Figure 1 |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005266799-A |
priorityDate | 2004-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 457.