http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005292444-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-24 |
filingDate | 2004-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ad4303c08fb17c1a005bd6b4d636e7ea http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b40ada315d0789564192dceb9481ef6d |
publicationDate | 2005-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2005292444-A |
titleOfInvention | Radiation sensitive resin composition |
abstract | PROBLEM TO BE SOLVED: To provide a water-stable film at the time of immersion exposure and satisfy a depth of focus margin. SOLUTION: The resin component constituting the radiation sensitive resin composition for immersion exposure is a polymer having a repeating unit containing a fluorine atom and a repeating unit containing an acid dissociable group-containing component, A repeating unit containing a fluorine atom is represented by the following formula (3). [Chemical 1] In the formula (3), R 7 represents a hydrogen atom, a fluorine atom, a methyl group or a fluoroalkyl group, R 8 represents a monovalent organic group, and at least one of R 9 and R 10 represents a fluoroalkyl group. , M is an integer from 0 to 3, n is an integer from 1 to 3, and m + n = 5. [Selection] Figure 1 |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2008044741-A1 |
priorityDate | 2004-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 472.