| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d93502a23a72b56472bc75854cfe7c60 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D1-40 |
| filingDate |
2004-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb9df332f02eed3f0dcdb9972eb7bda4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f97d0948b3670022f2afc28e8e78560b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d4e50e43b371da57463833cc1780df11 |
| publicationDate |
2005-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2005284115-A |
| titleOfInvention |
Radiation sensitive resin composition for slit spin coating and use thereof |
| abstract |
PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition suitable for forming a resin film on a large substrate by a slit spin coating method. A radiation-sensitive resin composition for slit spin coating, wherein the radiation-sensitive resin composition contains an alkali-soluble novolak resin and a photosensitizer and has a viscosity at 25 ° C. of 8 to 14 mPa · s. . A pattern forming method comprising applying the radiation sensitive resin composition for slit spin coating to a substrate by a slit coating method. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I392972-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007271941-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007305697-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006107056-A1 |
| priorityDate |
2004-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |