http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005284011-A

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filingDate 2004-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_430cecec3a87d6d06ecfe61026e7a132
publicationDate 2005-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2005284011-A
titleOfInvention Dye pattern forming method and dye pattern
abstract PROBLEM TO BE SOLVED: To provide a dye capable of easily forming a dye pattern having a high absorption intensity per unit film thickness, firmly attached to a base material in consideration of the above-mentioned conventional technical problems It is to provide a pattern forming method. Another object of the present invention is to provide a dye pattern having excellent film strength and high absorption intensity per unit film thickness. SOLUTION: A step of forming a polymerization initiating layer on a support by immobilizing a polymer having a functional group having a polymerization initiating ability in a side chain and a polymer having a crosslinkable group by a cross-linking reaction; and energy on the surface of the polymerization initiating layer. And forming a graft polymer having a dye skeleton in the molecule in a pattern only in the energy application region using the active point as a base point. By this method, a patterned graft having a polymerization initiating ability in a side chain and having a cross-linked structure on the support, and a patterned graft having a dye skeleton directly bonded to the surface of the polymerization initiating layer. A dye pattern having a polymer layer is obtained. [Selection figure] None
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