http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005275169-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1893 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1612 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-2086 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1608 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F291-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2004-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b007f5906bc3a65385b3ce1eccb1352 |
| publicationDate | 2005-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2005275169-A |
| titleOfInvention | Conductive pattern material and conductive pattern forming method |
| abstract | PROBLEM TO BE SOLVED: To provide a high-resolution conductive pattern material which is excellent in manufacturing suitability and excellent in durability and conductive stability. Moreover, the conductive pattern formation method which can manufacture the high-resolution conductive pattern excellent in durability and conductive stability with a simple process excellent in manufacturing suitability is provided. SOLUTION: Pattern exposure is performed on a substrate on which a compound having a polymerization initiation site capable of initiating radical polymerization by photocleavage and a substrate binding site is bonded, and the polymerization initiation site in the exposed region is deactivated. After that, an unsaturated compound capable of radical polymerization is brought into contact with the base material, and the entire surface is exposed to cause photocleavage at the polymerization initiation site remaining in the non-exposed region at the time of pattern exposure. A conductive pattern material produced by starting a graft polymer, and then a conductive material is attached to the graft polymer, and a method for forming the conductive pattern material. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012508897-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008004304-A |
| priorityDate | 2004-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 77.