| abstract |
A photosensitive composition used in a semiconductor manufacturing process such as an IC, a circuit board such as a liquid crystal or a thermal head, and other photofabrication processes, a compound used in the photosensitive composition, and the photosensitivity. Provided are a pattern forming method using a composition, a photosensitive composition having a small PEB temperature dependency and showing a good profile, a compound used for the photosensitive composition, and a pattern forming method using the photosensitive composition To do. A photosensitive composition containing a compound that generates a specific sulfonic imide upon irradiation with actinic rays or radiation, a compound that generates a specific compound upon irradiation with actinic rays or radiation, and irradiation with actinic rays or radiation The pattern formation method using the photosensitive composition containing the compound which generate | occur | produces a specific compound. |