http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005255704-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cebc9740ef706cde29e885504f274ffa |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D133-06 |
| filingDate | 2004-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b05339345fa5bddcc19a0c344dd88b50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a9cb2c912352424ee44b2fdd2fa2a30d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fec26edb11760d28821b91da9c0ba128 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_226b6375c16cb8d550353e4efd5fc7ac |
| publicationDate | 2005-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2005255704-A |
| titleOfInvention | Polymer |
| abstract | PROBLEM TO BE SOLVED: To provide a polymer excellent in solubility in a solvent and heat resistance and a composition thereof. It is another object of the present invention to provide a fine pattern manufacturing method using this polymer. Also provided are a polymer and a coating material for the antireflection film that are useful for adjusting the adhesion between the antireflection film applied to the substrate and the resist during the production of a semiconductor resist pattern. SOLUTION: At least one structural unit selected from the group consisting of a structural unit represented by the following formula (1) and a structural unit represented by the following formula (2-1) and the following formula (2-2). A polymer comprising [Chemical 1] (In Formula (1), R 1 represents a hydrogen atom or a methyl group. In Formula (2-1), R 21 represents a hydrogen atom or a methyl group. In Formula (2-2), R 22 represents a hydrogen atom. Or represents a methyl group.) [Selection figure] None |
| priorityDate | 2004-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 72.