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filingDate 2004-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_803adfc53f9796cbc59ac70d9f1f2a2b
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publicationDate 2005-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2005230947-A
titleOfInvention Method for forming fine uneven pattern and substrate for forming fine uneven pattern
abstract PROBLEM TO BE SOLVED: To provide a method for forming a fine uneven pattern in which both rearrangement of fine particles and fixation to a substrate surface are compatible. A step of preparing a particle dispersion in which particles are dispersed in a liquid dispersion medium, and a step of forming a trapping layer containing a polymer on a substrate with a layer thickness equal to or less than the average particle diameter of the particles. And forming a coating film by applying the particle dispersion on the trapping layer at a temperature not higher than the glass transition temperature of the trapping layer, and at a temperature not higher than the glass transition temperature of the trapping layer, A step of volatilizing the liquid dispersion medium from the coating film to form a deposition layer of the particles on the trapping layer; and heating the trapping layer to a glass transition temperature or higher so that only the bottom layer particles of the deposition layer are formed. Embedded in the trapping layer, the particle deposition layer is immersed in a liquid to remove particles not embedded in the trapping layer, and the bottom layer particle is disposed in the trapping layer. And a step of forming a particle layer. [Selection figure] None
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