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filingDate 2004-02-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6a8da5607bc715d8ee3730b14c40836d
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publicationDate 2005-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2005222782-A
titleOfInvention Method for forming porous thin film, dye-sensitized solar cell, and porous thin film photocatalyst
abstract By sputtering using a target in which a metal composed of a first metal component is dispersed in a compound of a second metal component different from the first metal component, a first metal component is formed on the substrate. Forming a composite thin film in which a metal portion made of a metal component and a metal compound portion made of a compound of a second metal component are mixed and dispersed with each other, and removing only the metal portion in the composite thin film; Dye-sensitized solar cell and porous thin film photocatalyst. [Effect] Efficient and economical deposition of a porous thin film having a high specific surface area suitable for a semiconductor thin film for a solar cell electrode, a thin film photocatalyst, etc. by a conventional apparatus without any special apparatus design change A dye-sensitized solar cell using this porous thin film as a semiconductor electrode for a dye-sensitized solar cell can obtain excellent photoelectric conversion efficiency, and if this porous thin film is used as a thin-film photocatalyst, Excellent photocatalytic performance can be obtained. [Selection figure] None
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