http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005202345-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_669c01133740c5233f2c8738904ea3af |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1335 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20 |
filingDate | 2004-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a6dc90182e4869e06e6701d02a854073 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_180a55decf7315b932bcc638a3480bf6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4855af7ac62fc508be055f6458a56619 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a716092fcfdfa77eeb1838b61a84195f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c41532583b9cb810e1512b884324d060 |
publicationDate | 2005-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2005202345-A |
titleOfInvention | Method for forming colored layer for color filter, exposure mask used in the method, color filter substrate, and liquid crystal display element |
abstract | A coloring layer for a color filter that can cope with the formation of a fine aperture of 12 μmφ or less in a colored layer as a color filter by virtue of a recent improvement in the visibility of a liquid crystal display device by a photolithography method using a proximity exposure method. A forming method is provided. After a negative photosensitive composition for forming a colored layer is disposed on a color filter forming substrate, exposure for forming the colored layer using an exposure mask having a predetermined pattern for forming the colored layer is provided. And further developing to obtain a colored layer having a circular opening, and the predetermined pattern for forming the colored layer of the exposure mask is provided with one circular opening in the colored layer. As a unit light-shielding pattern, a non-circular light-shielding unit that shields exposure light is disposed in an opening region that transmits exposure light, and exposure is performed using the exposure mask. A circular opening is formed in the exposed area of the colored layer opening pattern portion after development. [Selection] Figure 1 |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009069388-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009058899-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-101162313-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009122491-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007171333-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007171332-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008076724-A |
priorityDate | 2003-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 134.