| abstract |
PROBLEM TO BE SOLVED: To provide a resist composition intended to improve fine resolution, LER and depth of focus, and a resist pattern forming method using the resist composition. A resist composition containing (A) a resin component whose alkali solubility is changed by the action of an acid, and (B) an acid generator component that generates an acid upon exposure, wherein the component (A) comprises: The resin having a mass average molecular weight of 8000 or less containing the structural unit (a) derived from (meth) acrylic acid ester, and the component (B) is represented by the following general formula (b-1) or (b-2) A resist composition comprising at least one sulfonium compound represented. [Chemical 1] [Selection figure] None |