| abstract |
PROBLEM TO BE SOLVED: To improve alkali developability in a negative type thick film photoresist composition. (A) (a) 61 to 90% by mass of a structural unit derived from (meth) acrylic acid cyclic alkyl ester, and (b) a structural unit derived from a radically polymerizable compound having a hydroxyl group. Resin component, (B) a polymerizable compound having at least one ethylenically unsaturated double bond, (C) a photopolymerization initiator, and (D) an organic solvent, A photoresist composition for thick films, comprising: [Selection figure] None |