http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005187678-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-50
filingDate 2003-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_78edb2f5e0a24fdf18d132a6d7478235
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c432d4a3a183e36910687a6f606d7eb7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c6700b2e336b0b1e0671a857fd32d388
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publicationDate 2005-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2005187678-A
titleOfInvention Photopolymerizable composition
abstract PROBLEM TO BE SOLVED: To propose a highly sensitive photopolymerizable composition capable of efficiently generating active radicals by irradiation with energy rays, particularly light, and capable of polymerizing a radical curable substance in a short time. is there. A photopolymerizable composition comprising a compound represented by the following general formula (1), a compound represented by the following general formula (2), and a radical polymerizable compound. General formula (1) [Chemical 1] General formula (2) [Chemical 2] (However, in the formula, R1 and R2 each independently represents a monovalent organic residue. R1 and R2 may be a cyclic structure in which they are bonded together. R3 to R12 are each independent. Represents a hydrogen atom or a monovalent organic residue, provided that 1 to 4 of R5 to R12 include an organic residue represented by the following general formula (3). General formula (3) [Chemical 3] (In the formula, R13 represents a hydrogen atom or a monovalent organic residue.)
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priorityDate 2003-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 49.