http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005181516-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_669c01133740c5233f2c8738904ea3af |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-70 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1335 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate | 2003-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c41532583b9cb810e1512b884324d060 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_180a55decf7315b932bcc638a3480bf6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4855af7ac62fc508be055f6458a56619 |
| publicationDate | 2005-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2005181516-A |
| titleOfInvention | Method of forming resin-made black stripe for color filter, exposure mask used in the method, color filter substrate, and liquid crystal display element |
| abstract | In a conventional method for forming a black stripe made of resin for a color filter on a substrate by using a proximity exposure (proximity exposure) method, a high-definition display using an exposure apparatus, a photosensitive material, and a process. The present invention provides a method for forming a black stripe that can cope with the reduction in the width of the stripe (6 μm level) and the improvement in quality associated with the development. A normal proximity exposure position where an opening pattern of an exposure mask is faithfully transferred in its shape and direction after a negative photosensitive resin composition for black stripe formation is disposed on a color filter substrate. The photosensitive resin composition is subjected to a transfer condition adjusted by widening the exposure gap so that the square opening pattern is transferred to a shape rotated by 45 degrees after exposure and development by the diffraction effect. On the other hand, exposure is performed using an exposure mask having an opening pattern for forming a predetermined black stripe, and further development is performed to obtain a desired black stripe shape. [Selection] Figure 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012058201-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8241836-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008076724-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101129026-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009058899-A |
| priorityDate | 2003-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 134.