| abstract |
[PROBLEMS] To provide an etching solution composition that etches a metal film with good controllability, forms an appropriate taper shape, has a smooth surface, and has no resist bleeding. An etching solution composition for etching a metal film, comprising one or more surfactants selected from the group consisting of alkyl sulfate esters, perfluoroalkenyl phenyl ether sulfonic acids, and salts thereof. The said etching liquid composition containing. |