| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76838 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C30-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C26-00 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B31-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-469
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C26-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C30-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J7-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-20 |
| filingDate |
2003-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0990931cf91dc4df0df188d1b1bea717 |
| publicationDate |
2005-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2005150632-A |
| titleOfInvention |
Reduction device and reduction method |
| abstract |
PROBLEM TO BE SOLVED: To realize a high yield by executing a reduction process at a low temperature. An ion supply unit 21 heats a negative ion source S containing hydride ions at a predetermined temperature. The ion supply unit 21 takes out hydride ions from the negative ion source S by applying an electric field having a predetermined strength to the negative ion source S. The ion supply unit 21 supplies the extracted hydride ions into the processing chamber 51 with an inert gas as a carrier gas, and is formed on the surface of the metal film on the semiconductor wafer W arranged in the processing chamber 51. Reduce the oxidized film. [Selection] Figure 3 |
| priorityDate |
2003-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |