http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005146216-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7f9af914ed2fb00cd4f1b8b1a28964e4 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B6-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B6-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F283-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-037 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| filingDate | 2003-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_95c2720d6395f19da0cdb3384502f253 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b72930202fb2381f25d87365de425ea http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_18e5539f4563612b222a7eebb8307513 |
| publicationDate | 2005-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2005146216-A |
| titleOfInvention | Photosensitive polyamic acid varnish and method for producing product intermediate |
| abstract | PROBLEM TO BE SOLVED: To produce a photosensitive polyamic acid varnish that can be used for producing a specific polyimide and is highly convenient and capable of forming a finer and more accurate pattern, and a method for producing a product intermediate using the same I will provide a. [MEANS FOR SOLVING PROBLEMS] The present invention aims to solve the above problems by utilizing a photosensitive polyamic acid varnish containing a polyimide precursor represented by the following formula (I) and a specific compound. [Chemical 1] [In the above formula, X represents a divalent aryl group. ] |
| priorityDate | 2003-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 78.