| abstract |
The present invention provides a plasma processing method and apparatus capable of realizing both suppression of y value shift and reduction of luminance maintenance rate in a blue phosphor for PDP. An atmospheric pressure plasma processing apparatus has a gas supply port 1 that can be connected to a gas supply device 6 at one end, and a gas discharge port that can eject gas to an object to be processed 8 at the other end. 2 is provided with an insulating container 4 having two or more openings and one or more internal gas flow paths 3, and can be connected to a power supply device 7 around the insulating container 4. In the plasma processing apparatus provided with the plasma, the gas flow path 3 inside the insulator container 4 is curved or bent at least at one place between the position where the counter electrodes 5a and 5b are provided and the gas outlet 2. It is a processing device. [Selection] Figure 1 |