| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b62a061db267544224c10495ee0cd640 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F6-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F118-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F6-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F6-00 |
| filingDate |
2003-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0900d7f522aeca4e73569ed65620a79a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9efb4b31c34fb381ced5746f775a7212
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d24841636d255daafae8f2cb522e0f3d |
| publicationDate |
2005-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2005132974-A |
| titleOfInvention |
Method for producing copolymer for semiconductor lithography |
| abstract |
The present invention provides a method for producing a stable lithographic copolymer having a small difference between lots efficiently and with good reproducibility of quality. A method for producing a copolymer for semiconductor lithography by radical polymerization of a polymerizable compound having an ethylenic double bond using a polymerization initiator in the presence of a polymerization solvent, comprising a filter for filtration. 8, the next re-precipitation is performed in one sealable container 1 divided into a first part 1 a having the liquid supply means 2 and the stirring means 7 and a second part 1 b having the liquid draining means 5. The manufacturing method of the copolymer for semiconductor lithography characterized by refine | purifying with a filtration process. (1) Reprecipitation of supplying the polymerization reaction liquid obtained by the polymerization reaction from the liquid supply means 2 to the first part of the container containing the poor solvent, and bringing the solid matter into contact with the poor solvent. Step (2) A filtration step in which the liquid in which the solid matter is deposited is filtered with the filter 8 for filtration, the solvent is withdrawn from the liquid withdrawal means 5, and the solid matter that has been separated is separated. [Selection] Figure 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009037108-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8753793-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014159585-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015057463-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160138397-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102100268-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011252074-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009138083-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010169871-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008056737-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014214242-A |
| priorityDate |
2003-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |